Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate

doi:10.1016/j.mssp.2016.08.024

IHEP OpenIR > 多学科研究中心

	Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate
	Liu J(刘静); Liang YX(梁雅翔); Wang L(王琳); Wang B(王波); Zhang TC(张天冲); Yi FT(伊福廷); Liu, J; Liang, YX; Wang, L; Wang, B; Zhang, TC; Yi, FT
	2016
发表期刊	MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (IF:2.359[JCR-2016],2.305[5-Year])
ISSN	1369-8001
EISSN	1873-4081
卷号	56 页码:217-221
通讯作者	伊福廷
文章类型	Article
摘要	Silica nanopillars are used as substrate for Cadmium sulfide (CdS) photoresistor for the first time. The nanopillars substrate with the large surface ratio can increase the quantity of sensitive material and the surface of light response, which can improve the photosensitivity of the CdS photoresistor obviously. Silicon nanopillars are fabricated by Cesium Chloride (CsCI) self-assembly lithography and inductively coupled plasma (ICP) dry etching, after oxidation, the silicon nanopillars changes to silica nanopillars totally, then the 200 nm thickness CdS film is deposited on the nanopillars surface by RF magnetron sputtering using CdS ceramic target. XRD patterns of the nanopillar and planar substrates after CdS film covering indicate that all the deposited films are crystal. Photosensitivity properties of the photoresistor are tested by a home-made instrument in our group. The test results show that the nanopillar based photoresistor has the higher photosensitivity response than the planar one with different irradiance from 400 to 11,000 mu W/cm(2).. With 10,000 mu W/cm(2) irradiance at the room temperature, the photosensitivity response for the planar sample is only 62, while the response for the nanopillar sample achieves to 137, which is more than double of the planar one. The result reveals that the nanopillars morphology can be used as substrate to increase the property of the photoresistor. (C) 2016 Elsevier Ltd. All rights reserved.
关键词	Nanopillar Substrate Photosensitivity Cadmium sulfide Magnetron sputtering
DOI	10.1016/j.mssp.2016.08.024
关键词[WOS]	REFLECTION PROPERTIES ; SOLAR-CELLS ; NANOCRYSTALS
收录类别	SCI
语种	英语
WOS类目	Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号	WOS:000388085800031
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://ir.ihep.ac.cn/handle/311005/260320
专题	多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Liu J,Liang YX,Wang L,et al. Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate[J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,2016,56:217-221.
APA	刘静.,梁雅翔.,王琳.,王波.,张天冲.,...&Yi, FT.(2016).Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,56,217-221.
MLA	刘静,et al."Fabrication and photosensitivity of CdS photoresistor on silica nanopillars substrate".MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 56(2016):217-221.