Rapid roughening of Mo2C film surface

IHEP OpenIR > 实验物理中心

	Rapid roughening of Mo2C film surface
	Zheng, RL; Ran, YQ; Chen, H; Ping, RG; Ping RG(平荣刚)
	2000
发表期刊	ACTA PHYSICA SINICA
卷号	49 期号:7 页码:1335-1343
通讯作者	SW China Normal Univ, Dept Phys, Chongqing 400715, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100039, Peoples R China
文章类型	Article
摘要	The roughness of Mo2C film surface is measured and the results are given. By introduction of crystalline boundary correction,the rapid roughening phenomenon is explained theoretically.
关键词	Mo2C thin film rapid roughening roughness exponent
学科领域	Physics
URL	查看原文
语种	英语
WOS研究方向	Physics
WOS类目	Physics, Multidisciplinary
WOS记录号	WOS:000088125500025
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ihep.ac.cn/handle/311005/239288
专题	实验物理中心加速器中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Zheng, RL,Ran, YQ,Chen, H,et al. Rapid roughening of Mo2C film surface[J]. ACTA PHYSICA SINICA,2000,49(7):1335-1343.
APA	Zheng, RL,Ran, YQ,Chen, H,Ping, RG,&平荣刚.(2000).Rapid roughening of Mo2C film surface.ACTA PHYSICA SINICA,49(7),1335-1343.
MLA	Zheng, RL,et al."Rapid roughening of Mo2C film surface".ACTA PHYSICA SINICA 49.7(2000):1335-1343.