Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell.

doi:10.1016/j.mssp.2015.05.048

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	Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell.
	Liu J(刘静); Zhang XS(张新帅); Sun GJ(孙钢杰); Wang YT(王雨婷); Wang B(王波); Zhang TC(张天冲); Yi FT(伊福廷); 刘鹏(多); Liu; Jing; Zhang; Xinshuai; Sun; Gangjie; Wang; Bo; Zhang; Tianchong; Yi; Futing; Liu; Peng.
	2015
发表期刊	Materials Science in Semiconductor Processing (IF:2.359[JCR-2016],2.305[5-Year])
ISSN	1369-8001
EISSN	1873-4081
卷号	40 页码:44-49
通讯作者	伊福廷
文章类型	Article
摘要	Inverted pyramids were fabricated through a method combining cesium chloride (CsCl) self-assembly technology and anisotropy corrosion of silicon solar cells. Ti film with nanoporous masks was formed by lift-off the CsCl nanoislands for the inverted pyramids. The pyramids were then formed by anisotropy corrosion of alkaline solution. The average diameter and morphology of the pyramids were controlled by varying the average diameter of CsCl nanoislands from 400 nm to 1.5 mu m and by varying the etching time of alkaline solution from 2 to 8 min. The inverted-pyramid texture could suppress reflection to below 10% at wavelengths from 400 to 1000 nm, which was much lower than that of planar wafer. A solar cell fabricated from the pyramids had higher short-circuit current density (J(sc)) and photovoltaic conversion efficiency (PCE) compared with those of planar solar cells for the good antireflection property. The solar cell showed a PCE of 15.25%, a J(sc) of 38.35 mA/cm(2), and an open-circuit voltage of 555.7 mV. (C) 2015 Elsevier Ltd. All rights reserved.
关键词	Fabrication CsCl self-assembly Inverted pyramid Silicon solar cell
学科领域	Engineering; Materials Science; Physics
DOI	10.1016/j.mssp.2015.05.048
收录类别	SCI ; EI ; CA
语种	英语
WOS研究方向	Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS类目	Engineering ; Materials Science ; Physics
WOS记录号	WOS:000363344600006
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://ir.ihep.ac.cn/handle/311005/228871
专题	多学科研究中心
推荐引用方式 GB/T 7714	Liu J,Zhang XS,Sun GJ,et al. Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell.[J]. Materials Science in Semiconductor Processing,2015,40:44-49.
APA	刘静.,张新帅.,孙钢杰.,王雨婷.,王波.,...&Peng..(2015).Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell..Materials Science in Semiconductor Processing,40,44-49.
MLA	刘静,et al."Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell.".Materials Science in Semiconductor Processing 40(2015):44-49.