Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence

doi:10.1007/PL00012719

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	Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence
	Fan QM(范钦敏); Liu YW(刘亚雯); Wei CL(魏诚林); Fan, QM; Liu, YW; Wei, CL
	1996
发表期刊	FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY
卷号	354 期号:2 页码:#REF!
通讯作者	Fan, QM (reprint author), ACAD SINICA,INST HIGH ENERGY PHYS,POB 2732,BEIJING 100080,PEOPLES R CHINA.
文章类型	Article
摘要	Depth profiling of iron impurities on GaAs surfaces is performed by means of total reflection X-ray fluorescence. A numerical processing procedure presented previously is used for the evaluation of the experimental data. A detection limit of 10(11) atoms Fe/cm(2) on GaAs surfaces has been achieved.
学科领域	Chemistry
DOI	10.1007/PL00012719
收录类别	SCI
WOS类目	Chemistry, Analytical
WOS记录号	WOS:A1996TR64200012
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://ir.ihep.ac.cn/handle/311005/226835
专题	多学科研究中心
推荐引用方式 GB/T 7714	Fan QM,Liu YW,Wei CL,et al. Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence[J]. FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY,1996,354(2):#REF!.
APA	范钦敏,刘亚雯,魏诚林,Fan, QM,Liu, YW,&Wei, CL.(1996).Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence.FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY,354(2),#REF!.
MLA	范钦敏,et al."Depth profiling of iron impurities on GaAs surfaces using total reflection X-ray fluorescence".FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY 354.2(1996):#REF!.