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Elemental diffusion study of Ge/Al2O3 and Ge/AlN/Al2O3 interfaces upon post deposition annealing 期刊论文
Surfaces and Interfaces, 2017, 卷号: 9, 期号: 12, 页码: 51-57
Authors:  Zhu. Y.;  X. Wang;  C. Liu;  T. Wang;  H. Chen;  W.-H. Wang;  Y. Cheng;  W. Wang;  J. Wang;  S. Wang;  K. Cho;  H. Liu;  H. Lu and H. Dong;  Liu C(刘晨);  Wang JO(王嘉鸥)
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