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Investigation of the fine structure around the copper site in copper/zinc superoxide dismutase by XANES combined with ab initio calculations 期刊论文
RADIATION PHYSICS AND CHEMISTRY, 2017, 卷号: 137, 页码: 88-92
Authors:  Wang, Y;  Jin, S;  Li, J;  Zhou, J;  Zhang, LJ;  Wang, JQ;  Zhang, S;  Wei, XJ;  Jiang, Z;  Huang, YY;  Cui, PX;  Zhao, HF;  Chu, WS;  Zhao HF(赵海峰);  Chu SQ(储胜启)
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Copper/zinc superoxide dismutase  BioXAS  Metalloprotein  MXAN  
Mo/SiO2 multilayers for soft x-ray optical applications 期刊论文
JOURNAL OF APPLIED PHYSICS, 1999, 卷号: 85, 期号: 6, 页码: 3175-3179
Authors:  Wang, FP;  Wang, PX;  Lu, KQ;  Fang, ZZ;  Gao, M;  Duan, XF;  Cui, MQ;  Ma, HJ;  Jiang, XM;  Cui MQ(崔明启);  Ma HJ(马宏骥);  Jiang XM(姜晓明)
Adobe PDF(346Kb)  |  Favorite  |  View/Download:76/1  WOS cited times:[0]  ADS cited times:[4]  |  Submit date:2016/06/29
Mo/SiO_2软X射线多层膜的结构研究 期刊论文
电子显微学报, 1997, 期号: 4, 页码: 2
Authors:  王凤平;  王佩璇;  方正知;  崔明启;  王德武
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磁控溅射  Mo/SiO_2  周期结构  粗糙度  同步辐射装置  递推公式  结构研究  衍射谱  缓冲层  直流溅射  
Mo/SiO_2软X射线多层膜反射镜的界面分析 期刊论文
金属学报, 1997, 期号: 7, 页码: 737-741
Authors:  王凤平;  王佩璇;  方正知;  崔明启;  姜晓明;  马宏骥
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Mo/SiO_2多层膜  磁控溅射  同步辐射  低角X射线衍射  俄歇电子能谱  
多层膜界面粗糙度的低角X射线衍射研究 期刊论文
金属学报, 1996, 期号: 7, 页码: 774-779
Authors:  王凤平;  崔明启;  王佩璇;  方正知
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多层膜  磁控溅射  低角X射线衍射  界面粗糙度  
Ar气压强对溅射沉积的W/Si多层膜界面粗糙度的影响 期刊论文
功能材料与器件学报, 1995, 期号: 1, 页码: 53-57
Authors:  王凤平;  王佩璇;  崔明启;  方正知
Adobe PDF(260Kb)  |  Favorite  |  View/Download:317/1  |  Submit date:2015/12/25
磁控溅射  多层膜  小角X-射线衍射  界面粗糙度