Injector Design Towards ERL-Based EUV-FEL for Lithography

IHEP OpenIR > 学术会议 > 国际参会 > JaCoW高能所参会会议 > IPAC

	Injector Design Towards ERL-Based EUV-FEL for Lithography
	O.A. Tanaka; T. Miyajima; N. Nakamura; T. Tanikawa
	2022
Source Publication	Proceedings of the 13th International Particle Accelerator Conference
Conference Date	2022
Conference Place	Thailand
Document Type	会议论文
Identifier	http://ir.ihep.ac.cn/handle/311005/296393
Collection	学术会议_国际参会_JaCoW高能所参会会议_IPAC
Affiliation	KEK, Ibaraki, Japan
Recommended Citation GB/T 7714	O.A. Tanaka,T. Miyajima,N. Nakamura,et al. Injector Design Towards ERL-Based EUV-FEL for Lithography[C],2022.

Files in This Item:
File Name/Size	DocType	Version	Access	License

Application Full Text

Related Services

Bookmark

Google Scholar

Similar articles in Bing Scholar

Terms of Use

No data!

Social Bookmark/Share

All comments (0)

No comment.

The comment function is only available to registered usersLog In

If you have any objections to this item, please fill out the form below and the administrator will contact you as soon as possible.
Content:
Email：	*
Institution:
Verification Code:	Refresh

Any comments and suggestions are welcomed.
Title:	*
Content:
Email：	*
Verification Code:	Refresh

中国科学院高能物理研究所机构知识库