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Injector Design Towards ERL-Based EUV-FEL for Lithography
O.A. Tanaka; T. Miyajima; N. Nakamura; T. Tanikawa
Source PublicationProceedings of the 13th International Particle Accelerator Conference
Conference Date2022
Conference PlaceThailand
Document Type会议论文
AffiliationKEK, Ibaraki, Japan
Recommended Citation
GB/T 7714
O.A. Tanaka,T. Miyajima,N. Nakamura,et al. Injector Design Towards ERL-Based EUV-FEL for Lithography[C],2022.
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WEPOMS025.pdf(882KB)会议论文 限制开放CC BY-NC-SAApplication Full Text
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