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磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B_4C横向梯度多层膜
Alternative TitleLaterally graded periodic Mo/B_4C multilayer forextreme ultraviolet wavelength of 6.8-11.0 nm
朱京涛; 李淼; 朱圣明; 张嘉怡; 冀斌; 崔明启
2018
Source Publication强激光与粒子束
ISSN1001-4322
Volume30Issue:6Pages:61001
SubtypeArticle
Abstract用直流磁控溅射法结合掩模板控制膜厚的方法在Si衬底上制备了工作于6.8~11.0nm波段的[Mo/B4C]60横向梯度多层膜。利用X射线掠入射反射测试以及同步辐射反射率测试对梯度多层膜的结构及性能进行了测试。X射线掠入射反射测试结果表明,多层膜周期厚度沿着长轴方向从4.39nm逐渐增加到7.82nm,周期厚度平均梯度为0.054nm/mm。对横向梯度多层膜沿长轴方向每隔5mm进行了一次同步辐射反射率测试,结果显示,横向梯度多层膜在45°入射角下的反射率约为10%,反射峰的半高全宽介于0.13nm到0.31nm之间。
Keyword极紫外 横向梯度多层膜 Mo/B4C 磁控溅射 同步辐射
Language中文
CSCD IDCSCD:6250281
Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/286458
Collection多学科研究中心
Affiliation中国科学院高能物理研究所
First Author AffilicationInstitute of High Energy
Recommended Citation
GB/T 7714
朱京涛,李淼,朱圣明,等. 磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B_4C横向梯度多层膜[J]. 强激光与粒子束,2018,30(6):61001.
APA 朱京涛,李淼,朱圣明,张嘉怡,冀斌,&崔明启.(2018).磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B_4C横向梯度多层膜.强激光与粒子束,30(6),61001.
MLA 朱京涛,et al."磁控溅射法制备极紫外6.8~11.0 nm波段Mo/B_4C横向梯度多层膜".强激光与粒子束 30.6(2018):61001.
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