High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)

IHEP OpenIR > 学术会议 > 国际参会 > JaCoW高能所参会会议 > SRF

	High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)
	R.D.Porter; D.L.Hall; M.Liepe; J.T.Maniscalco
	2017
Source Publication	Proceedings of the 18th International Conference on RF Superconductivity
Conference Date	2017
Conference Place	Lanzhou, China
inspireid	1669500
Citation statistics	Cited Times:1 [INSPIRE]
Document Type	会议论文
Identifier	http://ir.ihep.ac.cn/handle/311005/265015
Collection	学术会议_国际参会_JaCoW高能所参会会议_SRF
Affiliation	Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
Recommended Citation GB/T 7714	R.D.Porter,D.L.Hall,M.Liepe,et al. High-performance Thin-film Niobium Produced via Chemical Vapor Deposition (CVD)[C],2017.

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