Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature
Ma, YH; Liu, FZ; Zhu, MF; Liu, JL; Wang, HH; Yang, Y; Li, YF; Wang HH(王焕华)
刊名NANOTECHNOLOGY
2009
卷号20期号:27页码:275201
学科分类Science & Technology - Other Topics; Materials Science; Physics
DOI10.1088/0957-4484/20/27/275201
通讯作者[Ma, Yanhong ; Liu, Fengzhen ; Zhu, Meifang ; Liu, Jinlong] Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China ; [Wang, Huan-hua] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yang, Yi ; Li, Yongfang] Chinese Acad Sci, Inst Chem, Beijing 100190, Peoples R China
文章类型Article
英文摘要Aligned amorphous and crystallized silicon nanorods (SiNRs) were successfully fabricated at low temperatures using radio frequency magnetron sputtering and hot wire chemical vapor deposition with glancing angle incident flux. The influences of the deposition pressure, sputtering power, substrate rotation and hydrogen dilution ratio on the diameter, density, orientation and crystallization of the Si nanorods were systematically investigated. With increasing sputtering power, the density of Si nanorods decreases and the diameter of SiNRs increases. The pressure has the opposite effect on the growth of SiNRs compared with the sputtering power. By combining glancing angle deposition ( GLAD) with the hydrogen diluted silane in hot wire chemical vapor deposition (HWCVD), aligned crystallized Si nanorods with a crystalline volume fraction of 0.55 were achieved under a substrate temperature of 140 degrees C. The Si nanorods have been tested for photovoltaic application.
类目[WOS]Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
研究领域[WOS]Science & Technology - Other Topics ; Materials Science ; Physics
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语种英语
WOS记录号WOS:000267089600003
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被引频次:16[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/241056
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
作者单位中国科学院高能物理研究所
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GB/T 7714
Ma, YH,Liu, FZ,Zhu, MF,et al. Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature[J]. NANOTECHNOLOGY,2009,20(27):275201.
APA Ma, YH.,Liu, FZ.,Zhu, MF.,Liu, JL.,Wang, HH.,...&王焕华.(2009).Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature.NANOTECHNOLOGY,20(27),275201.
MLA Ma, YH,et al."Aligned amorphous and microcrystalline Si nanorods by glancing angle deposition at low temperature".NANOTECHNOLOGY 20.27(2009):275201.
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