IHEP OpenIR  > 多学科研究中心
Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment
Zuo, ZW; Guan, WT; Wang, Y; Lu, J; Wang, JZ; Pu, L; Shi, Y; Zheng, YD; Luo, XY; Wang, HH; Wang HH(王焕华)
2011
发表期刊APPLIED PHYSICS LETTERS
卷号98期号:4页码:41902
通讯作者[Zuo, Z. W. ; Guan, W. T. ; Wang, Y. ; Lu, J. ; Wang, J. Z. ; Pu, L. ; Shi, Y. ; Zheng, Y. D.] Nanjing Univ, Sch Elect Sci & Engn, Key Lab Photon & Elect Mat, Nanjing 210093, Peoples R China ; [Luo, X. Y. ; Wang, H. H.] Inst High Energy Phys, Beijing Synchrotron Radiat Lab, Beijing 100049, Peoples R China
文章类型Article
摘要Microstructures of phosphorus-doped hydrogenated microcrystalline silicon (mu c-Si:H) thin films deposited by plasma-enhanced chemical vapor deposition are certainly dependent on the thickness of the H-2 plasma-treated amorphous silicon (a-Si:H) layers. An ultrathin H-treated a-Si:H layer is beneficial in obtaining a very thin mu c-Si:H film with high conductivity. Experimental results indicate that H-2 plasma treatment induces the occurrence of high-pressure H-2 in microvoids and causes compressive stress inside the ultrathin a-Si:H layers, thereby enhancing the generation of strained Si-Si bonds and nucleation sites and consequently accelerating the nucleation of mu c-Si:H films. (c) 2011 American Institute of Physics. [doi:10.1063/1.3548674]
学科领域Physics
研究领域[WOS]Physics ; Physics
DOI10.1063/1.3548674
URL查看原文
语种英语
研究领域[WOS]Physics ; Physics
WOS类目Physics, Applied
WOS记录号WOS:000286676600009
引用统计
被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/240601
专题多学科研究中心
作者单位中国科学院高能物理研究所
推荐引用方式
GB/T 7714
Zuo, ZW,Guan, WT,Wang, Y,et al. Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment[J]. APPLIED PHYSICS LETTERS,2011,98(4):41902.
APA Zuo, ZW.,Guan, WT.,Wang, Y.,Lu, J.,Wang, JZ.,...&王焕华.(2011).Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment.APPLIED PHYSICS LETTERS,98(4),41902.
MLA Zuo, ZW,et al."Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment".APPLIED PHYSICS LETTERS 98.4(2011):41902.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
8986.pdf(580KB)期刊论文作者接受稿限制开放CC BY-NC-SA请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Zuo, ZW]的文章
[Guan, WT]的文章
[Wang, Y]的文章
百度学术
百度学术中相似的文章
[Zuo, ZW]的文章
[Guan, WT]的文章
[Wang, Y]的文章
必应学术
必应学术中相似的文章
[Zuo, ZW]的文章
[Guan, WT]的文章
[Wang, Y]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。