Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment
Zuo, ZW; Guan, WT; Wang, Y; Lu, J; Wang, JZ; Pu, L; Shi, Y; Zheng, YD; Luo, XY; Wang, HH; Wang HH(王焕华)
刊名APPLIED PHYSICS LETTERS
2011
卷号98期号:4页码:41902
学科分类Physics
DOI10.1063/1.3548674
通讯作者[Zuo, Z. W. ; Guan, W. T. ; Wang, Y. ; Lu, J. ; Wang, J. Z. ; Pu, L. ; Shi, Y. ; Zheng, Y. D.] Nanjing Univ, Sch Elect Sci & Engn, Key Lab Photon & Elect Mat, Nanjing 210093, Peoples R China ; [Luo, X. Y. ; Wang, H. H.] Inst High Energy Phys, Beijing Synchrotron Radiat Lab, Beijing 100049, Peoples R China
文章类型Article
英文摘要Microstructures of phosphorus-doped hydrogenated microcrystalline silicon (mu c-Si:H) thin films deposited by plasma-enhanced chemical vapor deposition are certainly dependent on the thickness of the H-2 plasma-treated amorphous silicon (a-Si:H) layers. An ultrathin H-treated a-Si:H layer is beneficial in obtaining a very thin mu c-Si:H film with high conductivity. Experimental results indicate that H-2 plasma treatment induces the occurrence of high-pressure H-2 in microvoids and causes compressive stress inside the ultrathin a-Si:H layers, thereby enhancing the generation of strained Si-Si bonds and nucleation sites and consequently accelerating the nucleation of mu c-Si:H films. (c) 2011 American Institute of Physics. [doi:10.1063/1.3548674]
类目[WOS]Physics, Applied
研究领域[WOS]Physics
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语种英语
WOS记录号WOS:000286676600009
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被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/240601
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
作者单位中国科学院高能物理研究所
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Zuo, ZW,Guan, WT,Wang, Y,et al. Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment[J]. APPLIED PHYSICS LETTERS,2011,98(4):41902.
APA Zuo, ZW.,Guan, WT.,Wang, Y.,Lu, J.,Wang, JZ.,...&王焕华.(2011).Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment.APPLIED PHYSICS LETTERS,98(4),41902.
MLA Zuo, ZW,et al."Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment".APPLIED PHYSICS LETTERS 98.4(2011):41902.
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