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Evaluation on Pore Structures of Organosilicate Thin Films by Grazing Incidence Small-Angle X-ray Scattering
Chen, HJ; Li, SY; Liu, XJ; Li, RP; Smilgies, DM; Wu, ZH; Li, ZH; Wu ZH(吴忠华); Li ZH(李志宏)
2009
发表期刊JOURNAL OF PHYSICAL CHEMISTRY B
卷号113期号:38页码:12623-12627
通讯作者[Chen, Hong-Ji ; Li, Sheng-Ying ; Liu, Xiao-Jun] Jinan Univ, Dept Mat Sci & Engn, Guangzhou 510632, Guangdong, Peoples R China ; [Li, Rui-Peng ; Smilgies, Detlef-M.] Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14853 USA ; [Li, Rui-Peng ; Smilgies, Detlef-M.] Corning Inc, SP FR 6, Corning, NY 14830 USA ; [Wu, Zhong-Hua ; Li, Zhihong] Chinese Acad Sci, Inst High Energy Phys, Beijing Synchrotron Radiat Facil, Beijing 100039, Peoples R China
文章类型Article
摘要Nanoporous thin films fabricated by both a core-shell-shaped organic-inorganic hybrid sphere (octa(2,4-dinitrophenyl)silsesquioxane, ODNPSQ) and a four-leg-numbered surfactant (polyoxyethylene sorbitan monolaurate, Tween-20) for porogens in a higher molecular weight precursor (polyphenylsilsesquioxane, PPSQ) were characterized, respectively, by grazing incidence small-angle X-ray scattering (GISAXS), and the measured 2D GISAXS profiles were analyzed quantitatively by using a GISAXS formula based on the distorted wave Born approximation (DWBA). The fitted 2D GISAXS data show that the PPSQ porous thin films imprinted with ODNPSQ porogen exhibit sphere-shaped closed pores with the average pore size within a range of 1.18-3.12 nm and pore size distribution widths about 3.0 nm when the porogen loadings increase from 10 to 40 wt % and those imprinted with Tween-20 porogen give out an average pore size of 1.07-1.29 nm and pore size distribution widths about 2.0 nm with the porogen loading varying from 5 to 30 wt %. The nanoporous dielectric thin films imprinted with ODNPSQ porogen show a reducing to the molecular aggregation of porogens and significant antiphase separation behavior in the cross-linked matrix.
学科领域Chemistry
研究领域[WOS]Chemistry ; Chemistry
DOI10.1021/jp905457b
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语种英语
研究领域[WOS]Chemistry ; Chemistry
WOS类目Chemistry, Physical
WOS记录号WOS:000269747300001
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被引频次:5[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/240189
专题多学科研究中心
作者单位中国科学院高能物理研究所
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Chen, HJ,Li, SY,Liu, XJ,et al. Evaluation on Pore Structures of Organosilicate Thin Films by Grazing Incidence Small-Angle X-ray Scattering[J]. JOURNAL OF PHYSICAL CHEMISTRY B,2009,113(38):12623-12627.
APA Chen, HJ.,Li, SY.,Liu, XJ.,Li, RP.,Smilgies, DM.,...&李志宏.(2009).Evaluation on Pore Structures of Organosilicate Thin Films by Grazing Incidence Small-Angle X-ray Scattering.JOURNAL OF PHYSICAL CHEMISTRY B,113(38),12623-12627.
MLA Chen, HJ,et al."Evaluation on Pore Structures of Organosilicate Thin Films by Grazing Incidence Small-Angle X-ray Scattering".JOURNAL OF PHYSICAL CHEMISTRY B 113.38(2009):12623-12627.
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