IHEP OpenIR  > 多学科研究中心
The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering
Zhang, H; Liu, YS; Liu, WH; Wang, BY; Wei, L; Wang BY(王宝义); Wei L(魏龙)
2007
发表期刊ACTA PHYSICA SINICA
卷号56期号:12页码:7255-7261
通讯作者[Zhang Hui ; Liu Ying-Shu ; Liu Wen-Hai] Univ Sci & Technol Beijing, Sch Mech Engn, Beijing 100083, Peoples R China ; [Zhang Hui ; Wang Bao-Yi ; Wei Long] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
摘要The properties of vanadium pentoxide (V2O5) films deposited by reactive DC sputtering from vanadium target were investigated. In particular, the chemical state of elements and microstructure of films were analyzed by X-ray photoelectron spectroscopy, X-ray diffraction and field-emission scanning electron microscopy. The percentage of oxygen in the sputtering chamber affects the chemical state of vanadium in the film. Higher oxygen partial pressure makes to vanadium to be oxidized from V4+ to V5+, and the grain size increased with grain a shape of needles, but the content of oxygen with high binding energy decreases. Higher temperature of substrates causes the grains to grow from needles to large flakes lying parallel to the substrate, and vanadium is oxidized to the stable high binding energy states.
文章类型Article
关键词vanadium oxide magnetron sputtering phase change films X-ray photoelectron spectrum
学科领域Physics
研究领域[WOS]Physics
URL查看原文
语种英语
WOS类目Physics, Multidisciplinary
WOS记录号WOS:000252018900074
引用统计
被引频次:11[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/240110
专题多学科研究中心
作者单位中国科学院高能物理研究所
推荐引用方式
GB/T 7714
Zhang, H,Liu, YS,Liu, WH,et al. The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering[J]. ACTA PHYSICA SINICA,2007,56(12):7255-7261.
APA Zhang, H.,Liu, YS.,Liu, WH.,Wang, BY.,Wei, L.,...&魏龙.(2007).The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering.ACTA PHYSICA SINICA,56(12),7255-7261.
MLA Zhang, H,et al."The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering".ACTA PHYSICA SINICA 56.12(2007):7255-7261.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
7645.pdf(1870KB)期刊论文作者接受稿限制开放CC BY-NC-SA请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Zhang, H]的文章
[Liu, YS]的文章
[Liu, WH]的文章
百度学术
百度学术中相似的文章
[Zhang, H]的文章
[Liu, YS]的文章
[Liu, WH]的文章
必应学术
必应学术中相似的文章
[Zhang, H]的文章
[Liu, YS]的文章
[Liu, WH]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。