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High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies
Li, CH; Ju, X; Jiang, XD; Huang, J; Zhou, XD; Zheng, Z; Wu, WD; Zheng, WG; Li, ZX; Wang, BY; Yu, XH; Li ZX(李卓昕); Wang BY(王宝义)
2011
发表期刊OPTICS EXPRESS
卷号19期号:7页码:6447-6457
通讯作者[Li, C. H. ; Ju, X.] Univ Sci & Technol Beijing, Dept Phys, Beijing 100083, Peoples R China ; [Li, C. H. ; Jiang, X. D. ; Huang, J. ; Zhou, X. D. ; Zheng, Z. ; Wu, W. D. ; Zheng, W. G.] CAEP, Res Ctr Laser Fus, Mianyang 621900, Peoples R China ; [Li, Z. X. ; Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yu, X. H.] Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
文章类型Article
摘要We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm(2)) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism. (C) 2011 Optical Society of America
学科领域Optics
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语种英语
WOS研究方向Optics
WOS类目Optics
WOS记录号WOS:000288852700078
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被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/240076
专题多学科研究中心
核技术应用研究中心
作者单位中国科学院高能物理研究所
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Li, CH,Ju, X,Jiang, XD,et al. High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies[J]. OPTICS EXPRESS,2011,19(7):6447-6457.
APA Li, CH.,Ju, X.,Jiang, XD.,Huang, J.,Zhou, XD.,...&王宝义.(2011).High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies.OPTICS EXPRESS,19(7),6447-6457.
MLA Li, CH,et al."High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies".OPTICS EXPRESS 19.7(2011):6447-6457.
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