High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies

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	High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies
	Li, CH; Ju, X; Jiang, XD; Huang, J; Zhou, XD; Zheng, Z; Wu, WD; Zheng, WG; Li, ZX; Wang, BY; Yu, XH; Li ZX(李卓昕); Wang BY(王宝义)
	2011
发表期刊	OPTICS EXPRESS
卷号	19 期号:7 页码:6447-6457
通讯作者	[Li, C. H. ; Ju, X.] Univ Sci & Technol Beijing, Dept Phys, Beijing 100083, Peoples R China ; [Li, C. H. ; Jiang, X. D. ; Huang, J. ; Zhou, X. D. ; Zheng, Z. ; Wu, W. D. ; Zheng, W. G.] CAEP, Res Ctr Laser Fus, Mianyang 621900, Peoples R China ; [Li, Z. X. ; Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yu, X. H.] Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
文章类型	Article
摘要	We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm(2)) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism. (C) 2011 Optical Society of America
学科领域	Optics
研究领域[WOS]	Optics ; Optics
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语种	英语
研究领域[WOS]	Optics ; Optics
WOS类目	Optics
WOS记录号	WOS:000288852700078
引用统计
文献类型	期刊论文
条目标识符	http://ir.ihep.ac.cn/handle/311005/240076
专题	多学科研究中心核技术应用研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Li, CH,Ju, X,Jiang, XD,et al. High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies[J]. OPTICS EXPRESS,2011,19(7):6447-6457.
APA	Li, CH.,Ju, X.,Jiang, XD.,Huang, J.,Zhou, XD.,...&王宝义.(2011).High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies.OPTICS EXPRESS,19(7),6447-6457.
MLA	Li, CH,et al."High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies".OPTICS EXPRESS 19.7(2011):6447-6457.

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