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Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering
Zhang, L; Shi, LQ; He, ZJ; Zhang, B; Lu, YF; Liu, A; Wang, BY; Wang BY(王宝义)
2009
发表期刊SURFACE & COATINGS TECHNOLOGY
卷号203期号:22页码:3356-3360
通讯作者[Zhang, Lei. ; Shi, L. Q. ; He, Z. J. ; Zhang, B. ; Lu, Y. F. ; Liu, A.] Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China ; [Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
文章类型Article
摘要We report high quality Ti films grown in a novel electron cyclotron resonance (ECR) plasma-assisted magnetron sputtering (PMS) deposition system. The films are compared with films deposited by conventional direct current (DC) magnetron sputtering. Using ECR-PMS, the argon plasma bombardment energy and Ti film deposition rate can be controlled separately, with the substrate bias voltage under feedback control. Results from SEM, AFM, XRD and PAS (scanning electron microscopy, atomic force microscopy, X-ray diffraction and positron annihilation spectroscopy) show that the properties of Ti films prepared by ECR-PMS are greatly improved compared with conventional sputtering. SEM and AFM confirmed that ECR-PMS Ti films have a dense, smooth, mirror-like surface. Increasing the substrate bias of the ECR plasma from - 23 V to - 120 V while keeping a fixed sputtering bias voltage of - 40 V, the intensity of the (100) reflection of Ti film was a little strengthened, but (002) remained strongly preferred orientation. The XRD peak broadening of ECR-PMS Ti films is more than for conventional magnetron sputtering, due to grain refinement induced by At ion bombardment. Doppler broadening of PAS analysis reveals that the Ti films have fewer vacancy defects compared with films prepared by the conventional magnetron. (C) 2009 Elsevier B.V. All rights reserved.
关键词Ti thin film Magnetron sputtering ECR plasma
学科领域Materials Science; Physics
研究领域[WOS]Materials Science ; Physics ; Materials Science ; Physics
DOI10.1016/j.surfcoat.2009.04.022
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语种英语
研究领域[WOS]Materials Science ; Physics ; Materials Science ; Physics
WOS类目Materials Science, Coatings & Films ; Physics, Applied
WOS记录号WOS:000268044700005
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被引频次:10[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239896
专题多学科研究中心
作者单位中国科学院高能物理研究所
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Zhang, L,Shi, LQ,He, ZJ,et al. Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering[J]. SURFACE & COATINGS TECHNOLOGY,2009,203(22):3356-3360.
APA Zhang, L.,Shi, LQ.,He, ZJ.,Zhang, B.,Lu, YF.,...&王宝义.(2009).Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering.SURFACE & COATINGS TECHNOLOGY,203(22),3356-3360.
MLA Zhang, L,et al."Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering".SURFACE & COATINGS TECHNOLOGY 203.22(2009):3356-3360.
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