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Mo/SiO2 multilayers for soft x-ray optical applications
Wang, FP; Wang, PX; Lu, KQ; Fang, ZZ; Gao, M; Duan, XF; Cui, MQ; Ma, HJ; Jiang, XM; Cui MQ(崔明启); Ma HJ(马宏骥); Jiang XM(姜晓明)
1999
发表期刊JOURNAL OF APPLIED PHYSICS
卷号85期号:6页码:3175-3179
通讯作者Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China ; Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China ; Beijing Univ Sci & Technol, Dept Phys Mat, Beijing 100083, Peoples R China ; Beijing Lab Electron Microscopy, Beijing 100080, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100039, Peoples R China
文章类型Article
摘要The optimal reflectivity of soft-x-ray multilayers made of new pairs of materials was theoretically calculated in the wavelength range of 2.0-4.5 nm. Molybdenum and silicon dioxide were then selected for "high index'' and "low index'' layer, respectively, in the multilayer system. The microstructures and composition profiles of multilayers of molybdenum and silicon dioxide were investigated by means of low-angle x-ray diffraction, cross-sectional high resolution electron microscopy, an energy-filtering transmission electron microscope elemental mapping, and Auger electron spectrometry. The results show that no diffusion of Si into Mo layers has occurred, and only slight diffusion of O into Mo layers are seen. Sharp and relatively smooth interfaces have formed. With increasing number of layers, the interfacial roughness was propagated through the multilayer stack and low-frequency roughness increases while the high-frequency roughness decreases. (C) 1999 American Institute of Physics. [S0021-8979(99)00406-5].
学科领域Physics
研究领域[WOS]Physics ; Physics
DOI10.1063/1.369657
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语种英语
研究领域[WOS]Physics ; Physics
WOS类目Physics, Applied
WOS记录号WOS:000079021200024
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被引频次:7[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239879
专题多学科研究中心
作者单位中国科学院高能物理研究所
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Wang, FP,Wang, PX,Lu, KQ,et al. Mo/SiO2 multilayers for soft x-ray optical applications[J]. JOURNAL OF APPLIED PHYSICS,1999,85(6):3175-3179.
APA Wang, FP.,Wang, PX.,Lu, KQ.,Fang, ZZ.,Gao, M.,...&姜晓明.(1999).Mo/SiO2 multilayers for soft x-ray optical applications.JOURNAL OF APPLIED PHYSICS,85(6),3175-3179.
MLA Wang, FP,et al."Mo/SiO2 multilayers for soft x-ray optical applications".JOURNAL OF APPLIED PHYSICS 85.6(1999):3175-3179.
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