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The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation
Zhang RG(张仁刚); Wang BY(王宝义); Zhang H(张辉); Ma CX(马创新); Wei L(魏龙); Zhang, RG; Wang, BY; Zhang, H; Ma, CX; Long, W
2005
Source PublicationACTA PHYSICA SINICA
Volume54Issue:5Pages:2389-2393
Corresponding AuthorChinese Acad Sci, Inst High Energy Phys, Key Lab Nucl Anal Tech, Beijing 100049, Peoples R China
SubtypeArticle
AbstractZnS films are produced on the glass and quartz substrates by sulfidation of the as-sputtered ZnO films in the H2S-H-2-N-2 mixture. The properties of the films are characterized by using the XRD, SEM and transmission measurements. The results show that the ZnS films with a hexagonol structure have a (002) preferred orientation. The crystallinity and optical transmission spectra of the ZnS films are related to working pressure and Ar/O-2 ratio during the deposition of the ZnO films. At the pressure > 1 Pa, the thickness of the ZnS films is very small, while at the pressure < 1 Pa the ZnO films are not converted completely to ZnS phase. In addition, an Ar/O-2 ratio higher or lower than 4: 1 will leads to the poor crystalline ZnS films. Also it is found that the ZnS films formed from the unannealed ZnO films almost have the same grain size as those formed from the in-air annealed ZnO films, due to the high (002) preferred orientation during the growth of the ZnS films.
KeywordZnS films magnetron sputtering sulfidation of ZnO solar cells
Subject AreaPhysics
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Language英语
WOS Research AreaPhysics
WOS SubjectPhysics, Multidisciplinary
WOS IDWOS:000229049900078
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Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/239738
Collection核技术应用研究中心
多学科研究中心
中国科学院高能物理研究所_中国散裂中子源
Affiliation中国科学院高能物理研究所
First Author AffilicationInstitute of High Energy
Recommended Citation
GB/T 7714
Zhang RG,Wang BY,Zhang H,et al. The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation[J]. ACTA PHYSICA SINICA,2005,54(5):2389-2393.
APA 张仁刚.,王宝义.,张辉.,马创新.,魏龙.,...&Long, W.(2005).The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation.ACTA PHYSICA SINICA,54(5),2389-2393.
MLA 张仁刚,et al."The properties of the as-sputtered ZnO films under different deposition parameters after sulfidation".ACTA PHYSICA SINICA 54.5(2005):2389-2393.
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