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Investigations of helium incorporated into a film deposited by magnetron sputtering
Liu, CZ; Shi, LQ; Zhou, ZY; Hao, XP; Wang, BY; Liu, S; Wang, LB; Hao XP(郝小鹏); Wang BY(王宝义)
2007
发表期刊JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷号40期号:7页码:2150-2156
通讯作者Fudan Univ, Inst Modern Phys, Shanghai, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing, Peoples R China ; Chinese Acad Sci, Inst Phys Met, Shenyang, Peoples R China
文章类型Article
摘要Helium-containing titanium film was prepared by magnetron sputtering in a gas mixture of helium and argon. This method distinctly differs from traditional helium introduction into metals. A high concentration of helium up to 45 at.% and a uniform distribution in the bulk were shown by ion beam analysis. The process of helium incorporation is considered in which the helium particles are energetically backscattered from the target, fly through the glow discharge zone and are consequently embedded into the growing film. It is virtually a continuous sub-threshold-energy implantation during film deposition based on the plasma technique. The limited partial pressure of argon is to maintain the discharge and sputter the titanium target. The helium content incorporated can be controlled conveniently by adjusting the pressure of the working gases. X-ray diffraction, transmission electron microscopy, Doppler broadening of positron beam analysis and thermal helium desorption spectroscopy revealed the microstructure of titanium films, the state of helium bubbles, the defect characteristic related to helium and thermal release behaviour of helium from the titanium film.
学科领域Physics
研究领域[WOS]Physics ; Physics
DOI10.1088/0022-3727/40/7/044
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语种英语
研究领域[WOS]Physics ; Physics
WOS类目Physics, Applied
WOS记录号WOS:000245301300044
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被引频次:20[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239668
专题多学科研究中心
作者单位中国科学院高能物理研究所
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Liu, CZ,Shi, LQ,Zhou, ZY,et al. Investigations of helium incorporated into a film deposited by magnetron sputtering[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(7):2150-2156.
APA Liu, CZ.,Shi, LQ.,Zhou, ZY.,Hao, XP.,Wang, BY.,...&王宝义.(2007).Investigations of helium incorporated into a film deposited by magnetron sputtering.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(7),2150-2156.
MLA Liu, CZ,et al."Investigations of helium incorporated into a film deposited by magnetron sputtering".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.7(2007):2150-2156.
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