Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers
Wei XJ(魏向军); Xu Q(徐清); Jia QJ(贾全杰); Wang HH(王焕华); Feng SL(冯松林); Wei, XJ; Qing, X; Wang, TM; Jia, QJ; Wang, HH; Feng, SL
刊名ACTA PHYSICA SINICA
2006
卷号55期号:3页码:1508-1511
关键词phase depth profile shape memory TiNi multilayer
学科分类Physics
通讯作者Lanzhou Univ, Inst Phys Sci & Technol, Lanzhou 730000, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
文章类型Article
英文摘要Phase depth profile in TiNi shape memory alloy films is studied by the combination of grazing-incidence X-ray diffraction and X-ray reflectivity measurement. The film is made from sputter-deposited Ni/Ti multilayers. At room temperature, both the phase depth profile and element depth profile are not uniform, and both have multilayer structure. There is a three-phase mixture region consisting of T3Ni4 precipitates, martensite and a little of austenite near the free surface. A uniform martensite phase is formed near the substrate. Diffusion and reaction take place between film and substrate. The simulation result of X-ray reflectivity shows that the results of film microstructure analysis are reasonable. It is the kinetic factors that mainly cause the ununiformity of phase depth profile in the film.
类目[WOS]Physics, Multidisciplinary
研究领域[WOS]Physics
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语种英语
WOS记录号WOS:000235919300086
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文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239392
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
作者单位中国科学院高能物理研究所
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GB/T 7714
Wei XJ,Xu Q,Jia QJ,et al. Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers[J]. ACTA PHYSICA SINICA,2006,55(3):1508-1511.
APA 魏向军.,徐清.,贾全杰.,王焕华.,冯松林.,...&Feng, SL.(2006).Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers.ACTA PHYSICA SINICA,55(3),1508-1511.
MLA 魏向军,et al."Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers".ACTA PHYSICA SINICA 55.3(2006):1508-1511.
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