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Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers
Wei XJ(魏向军); Xu Q(徐清); Jia QJ(贾全杰); Wang HH(王焕华); Feng SL(冯松林); Wei, XJ; Qing, X; Wang, TM; Jia, QJ; Wang, HH; Feng, SL
2006
发表期刊ACTA PHYSICA SINICA
卷号55期号:3页码:1508-1511
通讯作者Lanzhou Univ, Inst Phys Sci & Technol, Lanzhou 730000, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
文章类型Article
摘要Phase depth profile in TiNi shape memory alloy films is studied by the combination of grazing-incidence X-ray diffraction and X-ray reflectivity measurement. The film is made from sputter-deposited Ni/Ti multilayers. At room temperature, both the phase depth profile and element depth profile are not uniform, and both have multilayer structure. There is a three-phase mixture region consisting of T3Ni4 precipitates, martensite and a little of austenite near the free surface. A uniform martensite phase is formed near the substrate. Diffusion and reaction take place between film and substrate. The simulation result of X-ray reflectivity shows that the results of film microstructure analysis are reasonable. It is the kinetic factors that mainly cause the ununiformity of phase depth profile in the film.
关键词phase depth profile shape memory TiNi multilayer
学科领域Physics
研究领域[WOS]Physics ; Physics
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语种英语
研究领域[WOS]Physics ; Physics
WOS类目Physics, Multidisciplinary
WOS记录号WOS:000235919300086
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被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239392
专题多学科研究中心
作者单位中国科学院高能物理研究所
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GB/T 7714
Wei XJ,Xu Q,Jia QJ,et al. Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers[J]. ACTA PHYSICA SINICA,2006,55(3):1508-1511.
APA 魏向军.,徐清.,贾全杰.,王焕华.,冯松林.,...&Feng, SL.(2006).Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers.ACTA PHYSICA SINICA,55(3),1508-1511.
MLA 魏向军,et al."Microstructure of TiNi shape memory alloy films made of sputter-deposited Ni/Ti multilayers".ACTA PHYSICA SINICA 55.3(2006):1508-1511.
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