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Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source
Gong, Y; Chen, B; Ni, QL; Cui, MQ; Zhao, YD; Wu, ZH; Cui MQ(崔明启); Zhao YD(赵屹东); Wu ZH(吴忠华)
2005
发表期刊HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
卷号29期号:11页码:1104-1106
通讯作者CAS, State Key Lab Appl Opt, Inst Opt, Changchun 130033, Peoples R China ; CAS, Inst High Energy Phys, Beijing 100049, Peoples R China
文章类型Article
摘要The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and, multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.
关键词synchrotron radiation source glazing exit X-ray fluorescence thin film
学科领域Physics
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语种英语
WOS研究方向Physics
WOS类目Physics, Nuclear ; Physics, Particles & Fields
WOS记录号WOS:000233323300016
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文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239050
专题多学科研究中心
作者单位中国科学院高能物理研究所
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GB/T 7714
Gong, Y,Chen, B,Ni, QL,et al. Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29(11):1104-1106.
APA Gong, Y.,Chen, B.,Ni, QL.,Cui, MQ.,Zhao, YD.,...&吴忠华.(2005).Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29(11),1104-1106.
MLA Gong, Y,et al."Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29.11(2005):1104-1106.
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