Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source
Gong, Y; Chen, B; Ni, QL; Cui, MQ; Zhao, YD; Wu, ZH; Cui MQ(崔明启); Zhao YD(赵屹东); Wu ZH(吴忠华)
刊名HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
2005
卷号29期号:11页码:1104-1106
关键词synchrotron radiation source glazing exit X-ray fluorescence thin film
学科分类Physics
通讯作者CAS, State Key Lab Appl Opt, Inst Opt, Changchun 130033, Peoples R China ; CAS, Inst High Energy Phys, Beijing 100049, Peoples R China
文章类型Article
英文摘要The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and, multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.
类目[WOS]Physics, Nuclear ; Physics, Particles & Fields
研究领域[WOS]Physics
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语种英语
WOS记录号WOS:000233323300016
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文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/239050
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
中国科学院高能物理研究所_多学科研究中心
作者单位中国科学院高能物理研究所
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GB/T 7714
Gong, Y,Chen, B,Ni, QL,et al. Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29(11):1104-1106.
APA Gong, Y.,Chen, B.,Ni, QL.,Cui, MQ.,Zhao, YD.,...&吴忠华.(2005).Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29(11),1104-1106.
MLA Gong, Y,et al."Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29.11(2005):1104-1106.
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