SAXS analysis of interface in organo-modified mesoporous silica
Li, ZH; Gong, YJ; Wu, D; Sun, YH; Wang, J; Liu, Y; Dong, BZ; Wang J(王俊); Liu Y(柳义); Dong BZ(董宝中)
刊名SURFACE AND INTERFACE ANALYSIS
2001
卷号31期号:9页码:897-900
关键词organo-modified mesoporous silica interface SAXS negative deviation Porod's law
学科分类Chemistry
DOI10.1002/sia.1118
通讯作者Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Peoples R China ; Acad Sinica, Inst High Energy Phys, Lab Synchrotron Radiat, Beijing 100039, Peoples R China
文章类型Article
英文摘要A small-angle x-ray scattering (SAXS) technique using synchrotron radiation as the x-ray source has been employed to characterize the microstructure of mesoporous silica prepared by one-pot template-directed synthesis methodology. The scattering of pure silica agreed with Porod's law. The scattering of organo-modified mesoporous silica showed a negative deviation from Porod's law, suggesting that an interfacial layer exists between the pores and silica matrix. It was the organic groups comprising the interface, as shown by Si-29 cross-polarization magic-angle spinning nuclear magnetic resonance imaging (Si-2(9) CP MASNMR) and Fourier transform infrared spectroscopy (FTIR), that caused this negative deviation of SAXS intensity from Porod's law, and the average thickness of the interfacial layer could be deduced from this negative deviation. Copyright (C) 2001 John Wiley & Sons, Ltd.
类目[WOS]Chemistry, Physical
研究领域[WOS]Chemistry
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语种英语
WOS记录号WOS:000171115100014
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被引频次:12[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/238697
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
作者单位中国科学院高能物理研究所
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Li, ZH,Gong, YJ,Wu, D,et al. SAXS analysis of interface in organo-modified mesoporous silica[J]. SURFACE AND INTERFACE ANALYSIS,2001,31(9):897-900.
APA Li, ZH.,Gong, YJ.,Wu, D.,Sun, YH.,Wang, J.,...&董宝中.(2001).SAXS analysis of interface in organo-modified mesoporous silica.SURFACE AND INTERFACE ANALYSIS,31(9),897-900.
MLA Li, ZH,et al."SAXS analysis of interface in organo-modified mesoporous silica".SURFACE AND INTERFACE ANALYSIS 31.9(2001):897-900.
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