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Formation of metal nanoparticles in silica by the sequential implantation of Ag and Cu
Xiao, XH; Guo, LP; Ren, F; Wang, JB; Fu, DJ; Chen, DL; Wu, ZY; Jia, QJ; Liu, C; Jiang, CZ; Chen DL(陈栋梁); Wu ZY(吴自玉); Jia QJ(贾全杰)
2007
发表期刊APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
卷号89期号:3页码:681-684
通讯作者Wuhan Univ, Minist Educ, Key Lab Acoust & Photon Mat & Devices, Wuhan 430072, Peoples R China ; Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing Synchrotron Radiat Facil, Beijing 100049, Peoples R China
摘要Spherical-like nanoparticles have been formed by sequentially ion-implanting Ag/Cu into silica glasses. During sequential Ag/Cu ion implantation, the diameter of Cu nanoparticles is increased and the average Ag nanoparticle diameter is decreased with increasing Cu ion dose. The evolution of nanoparticles is characterized by grazing incidence X-ray diffraction, extended X-ray absorption fine structure spectroscopy and transmission electron microscopy. Nanovoids in the nanoparticles are formed by sequential ion implantation.
文章类型Article
学科领域Materials Science; Physics
研究领域[WOS]Materials Science ; Physics
DOI10.1007/s00339-007-4146-y
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语种英语
WOS类目Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号WOS:000249663500017
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被引频次:6[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/238260
专题多学科研究中心
作者单位中国科学院高能物理研究所
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Xiao, XH,Guo, LP,Ren, F,et al. Formation of metal nanoparticles in silica by the sequential implantation of Ag and Cu[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2007,89(3):681-684.
APA Xiao, XH.,Guo, LP.,Ren, F.,Wang, JB.,Fu, DJ.,...&贾全杰.(2007).Formation of metal nanoparticles in silica by the sequential implantation of Ag and Cu.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,89(3),681-684.
MLA Xiao, XH,et al."Formation of metal nanoparticles in silica by the sequential implantation of Ag and Cu".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 89.3(2007):681-684.
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