Peking Univ, Inst Chem Phys, State Key Lab Struct Chem Unstable & Stable Speci, Beijing 100871, Peoples R China
; Chinese Acad Sci, Inst High Energy Phys, Beijing 100039, Peoples R China
The dispersion capacity of MoO3 on the surface of muscovite powder was studied by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) techniques. The results indicated that MoO3 can disperse onto the surface of a support as a sub-monolayer. The dispersion capacity was 5.88 mg MoO3 (g muscovite)(-1), or 3.24 Mo atoms nm(-2). The diffusing process of MoO3 on muscovite wafer was investigated by means of Synchrotron Radiation excited Total-reflection X-Ray Fluorescence spectroscopy (SR-TXRF). A stripe of MoO3 on the muscovite wafer was used as the diffusion source. After thermal treatment in air or dry N-2, MoO3 diffuses onto the surface of muscovite and forms a sub-monolayer. Sublimation of MoO3 was also detected during the diffusion process. The diffusion rate in two heating atmospheres differed significantly. The diffusion rate of MoO3 on muscovite in dry N-2 was greater than that in air. A possible explanation of the phenomena is that surface diffusion onto the muscovite surface plays a more important role in the process than transportation via gas phase during the diffusion of MoO3.
Zhao, LY,Wang, XK,Wu, NZ,et al. Study of monolayer dispersion of MoO3 on muscovite powder and diffusing behavior of MoO3 on muscovite wafer by SR-TXRF[J]. JOURNAL OF MATERIALS CHEMISTRY,2003,13(1):102-105.
Zhao, LY.,Wang, XK.,Wu, NZ.,Huang, YY.,He, W.,...&何伟.(2003).Study of monolayer dispersion of MoO3 on muscovite powder and diffusing behavior of MoO3 on muscovite wafer by SR-TXRF.JOURNAL OF MATERIALS CHEMISTRY,13(1),102-105.
Zhao, LY,et al."Study of monolayer dispersion of MoO3 on muscovite powder and diffusing behavior of MoO3 on muscovite wafer by SR-TXRF".JOURNAL OF MATERIALS CHEMISTRY 13.1(2003):102-105.