Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques
Xiang; QY; Zhang; K; Wang; Y; Lou; XJ; Yao; WQ; Bai; Y; Duan; DW; Hu; XP; Wang; J; Luo; ZD; Wang; HH; Zhang; LX; Klemradt; U; Cao; JL; Wang HH(王焕华)
2015
卷号7期号:49页码:27351-27356
关键词Pb(Zr,Ti)O-3 ferroelectric thin films metal/oxide interface metal-hydrogenation detaching method thickness dependence targeted interface engineering
学科分类Science & Technology - Other Topics; Materials Science
DOI10.1021/acsami.5b08919
文章类型Article
英文摘要Connections between metals and heterogeneous solid state materials form buried interfaces. These ubiquitous structures play an essential role in determining the performances of many nano- and microdevices. However, the information about the chemistry, structure, and properties of these real interfaces is intrinsically difficult to extract by traditional techniques. Therefore, approaches to efficiently discovering metalized interfaces are in high demand. Here, we demonstrate the transformation of nanoscale metal/oxide interface problems into surface problems through a novel metal-hydrogenation detaching method. We applied this technique to study the thickness dependence in Pb(Zr,Ti)O-3 (PZT) ferroelectric thin films, a long-standing interface problem in a model metal/insulator device,(1-6) and this allowed comprehensive surface analytical techniques to be adapted. A nonstoichiometric interfacial layer of 4.1 nm thick with low mass density, low permittivity, and weak ferro electricity was quantified at the Pt/PZT interface and attributed to the preferential diffusions among the compositional elements. Targeted interface engineering by Pb rebalance led to a substantial recovery of ferroelectric properties. Our results therefore pave the way to a better understanding of metallized interface in ferroelectric and dielectric nanodevices. We hope that more useful information about metalized interfaces of other solid materials could, analogously, be accessed by surface analytical techniques.
类目[WOS]Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
收录类别SCI ; EI
WOS记录号WOS:000366873900038
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被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/229109
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
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Xiang,QY,Zhang,et al. Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques[J],2015,7(49):27351-27356.
APA Xiang.,QY.,Zhang.,K.,Wang.,...&王焕华.(2015).Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques.,7(49),27351-27356.
MLA Xiang,et al."Insight into Metalized Interfaces in Nano Devices by Surface Analytical Techniques".7.49(2015):27351-27356.
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