| Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer |
| Liu J(刘静) ; Zhang XS(张新帅) ; Sun GJ(孙钢杰) ; Wang YT(王雨婷); Wang B(王波) ; Zhang TC(张天冲) ; Yi FT(伊福廷) ; Liu; J.; X. Zhang; G. Sun; Y. Wang; B. Wang; T. Zhang; F. Yi; F. Chen
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| 2015
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发表期刊 | Energy Technology
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卷号 | 4期号:2页码:298-303 |
通讯作者 | 伊福廷
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文章类型 | Article
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DOI | 10.1002/ente.201500229
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收录类别 | EI
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引用统计 |
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文献类型 | 期刊论文
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条目标识符 | http://ir.ihep.ac.cn/handle/311005/228954
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专题 | 多学科研究中心
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推荐引用方式 GB/T 7714 |
Liu J,Zhang XS,Sun GJ,et al. Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer[J]. Energy Technology,2015,4(2):298-303.
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APA |
刘静.,张新帅.,孙钢杰.,王雨婷.,王波.,...&F. Chen.(2015).Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer.Energy Technology,4(2),298-303.
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MLA |
刘静,et al."Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective-Area Silicon Nanopillars by Cesium Chloride Self-Assembly Lithography as Antireflective Layer".Energy Technology 4.2(2015):298-303.
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Adobe PDF
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