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Nano-oxide thin films deposited via atomic layer deposition on microchannel plates
Yan BJ(闫保军); Liu SL(刘术林); Heng YK(衡月昆); Yan, BJ; Liu, SL; Heng, YK
2015
发表期刊NANOSCALE RESEARCH LETTERS
卷号10页码:162
通讯作者闫保军
摘要Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO: Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO: Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.
文章类型Article
关键词Microchannel plate (MCP) Atomic layer deposition (ALD) Thin film High aspect ratio Electrical performance
学科领域Science & Technology - Other Topics; Materials Science; Physics
DOI10.1186/s11671-015-0870-y
收录类别SCI ; EI ; CA
WOS类目Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号WOS:000352704500001
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/228346
专题实验物理中心
多学科研究中心
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Yan BJ,Liu SL,Heng YK,et al. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates[J]. NANOSCALE RESEARCH LETTERS,2015,10:162.
APA 闫保军,刘术林,衡月昆,Yan, BJ,Liu, SL,&Heng, YK.(2015).Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.NANOSCALE RESEARCH LETTERS,10,162.
MLA 闫保军,et al."Nano-oxide thin films deposited via atomic layer deposition on microchannel plates".NANOSCALE RESEARCH LETTERS 10(2015):162.
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