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Investigating electron interacting dark matter
Bernabei, R; Belli, P; Montecchia, F; Nozzoli, F; Cappella, F; Incicchitti, A; Prosperi, D; Cerulli, R; Dai, CJ; He, HL; Kuang, HH; Ma, JM; Ma, XH; Sheng, XD; Ye, ZP; Wang, RG; Zhang, YJ; Dai ZJ(戴长江); He HL(何会林); Kuang HH(况浩怀); Ma JM(马基茂); Ma XH(马欣华); Sheng XD(盛祥东); Ye ZP(叶子飘)
2008
发表期刊PHYSICAL REVIEW D
卷号77期号:2页码:23506
通讯作者Bernabei, R (reprint author), Univ Roma Tor Vergata, Dipartimento Fis, I-00133 Rome, Italy.
文章类型Article
摘要Some extensions of the standard model provide dark matter candidate particles which can have a dominant coupling with the lepton sector of the ordinary matter. Thus, such dark matter candidate particles (chi(0)) can be directly detected only through their interaction with electrons in the detectors of a suitable experiment, while they are lost by experiments based on the rejection of the electromagnetic component of the experimental counting rate. These candidates can also offer a possible source of the 511 keV photons observed from the galactic bulge. In this paper this scenario is investigated. Some theoretical arguments are developed and related phenomenological aspects are discussed. Allowed intervals and regions for the characteristic phenomenological parameters of the considered model and of the possible mediator of the interaction are also derived considering the DAMA/NaI data.
学科领域Astronomy & Astrophysics; Physics
DOI10.1103/PhysRevD.77.023506
收录类别SCI
WOS类目Astronomy & Astrophysics ; Physics, Particles & Fields
WOS记录号WOS:000252864000021
引用统计
被引频次:101[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/227882
专题粒子天体物理中心
中国科学院高能物理研究所_教育处
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GB/T 7714
Bernabei, R,Belli, P,Montecchia, F,et al. Investigating electron interacting dark matter[J]. PHYSICAL REVIEW D,2008,77(2):23506.
APA Bernabei, R.,Belli, P.,Montecchia, F.,Nozzoli, F.,Cappella, F.,...&叶子飘.(2008).Investigating electron interacting dark matter.PHYSICAL REVIEW D,77(2),23506.
MLA Bernabei, R,et al."Investigating electron interacting dark matter".PHYSICAL REVIEW D 77.2(2008):23506.
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