Study of the diffusion behaviour of MoO3 and ZnO on oxide thin films by SR-TXRF
Xu, WM; Xu, JQ; Wu, NZ; Yan, JF; Zhu, YF; Huang, YY; He, W; Xie, YC; Huang YY(黄宇营); He W(何伟)
刊名SURFACE AND INTERFACE ANALYSIS
2001
卷号32期号:1页码:#REF!
关键词MoO3 ZnO Al2O3 TiO2 SiO2 thin film SR-TXRF
学科分类Chemistry
DOI10.1002/sia.1060
通讯作者Wu, NZ (reprint author), Beijing Univ, Inst Phys Chem, State Key Lab Struct Chem Unstable & Stable Speci, Beijing 100871, Peoples R China.
文章类型Article; Proceedings Paper
英文摘要The diffusion process Of MoO3 and ZnO on stable oxide thin films (SiO2, Al2O3, TiO2) was investigated mainly by means of synchrotron-radiation-excited total reflection x-ray fluorescence spectroscopy (SR-TXRF). A stripe Of MoO3 or ZnO on the oxide thin film was used as the diffusion source. After thermal treatment, MoO3 diffused onto the surface of those films and formed a monolayer or a submonolayer. The diffusion capacity and the diffusion rate Of MoO3 on each film differed significantly. Sublimation of MoO3 also was detected during the diffusion process. A possible explanation for all the phenomena is the combination of surface diffusion onto the surface of the support and transportation via the gas phase. By contrast, ZnO hardly diffuses onto the surface of the film due to its high melting point. Copyright (C) 2001 John Wiley & Sons, Ltd.
类目[WOS]Chemistry, Physical
收录类别SCI
WOS记录号WOS:000170551800067
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/227510
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
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Xu, WM,Xu, JQ,Wu, NZ,et al. Study of the diffusion behaviour of MoO3 and ZnO on oxide thin films by SR-TXRF[J]. SURFACE AND INTERFACE ANALYSIS,2001,32(1):#REF!.
APA Xu, WM.,Xu, JQ.,Wu, NZ.,Yan, JF.,Zhu, YF.,...&何伟.(2001).Study of the diffusion behaviour of MoO3 and ZnO on oxide thin films by SR-TXRF.SURFACE AND INTERFACE ANALYSIS,32(1),#REF!.
MLA Xu, WM,et al."Study of the diffusion behaviour of MoO3 and ZnO on oxide thin films by SR-TXRF".SURFACE AND INTERFACE ANALYSIS 32.1(2001):#REF!.
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