Wang, J (reprint author), Chinese Acad Sci, Ctr Synchrotron Radiat, Inst High Energy Phys, POB 9182-7, Beijing 100039, Peoples R China.
An X-ray reflectivity (XR) study of the dynamic evolution of the film surface was carried out for molybdenum (Mo) sputter-deposited onto silicon substrates. The Mo-air interface width grows with time, and exhibits a power law behavior. The growth exponent beta is found to be 0.42. The time-invariant self-affine behavior an the short-range scale has also been observed, and is consistent with the dynamic scaling theory. The roughness exponent alpha is found to be 0.89 +/- 0.05. Scanning tunneling microscopy (STM) was also used to characterize the surface and showed good agreement with the XR measurements.