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X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films
Wang J(王俊); Li G(黎刚); Cui MQ(崔明启); Jiang XM(姜晓明); Wang, J; Li, G; Yang, P; Cui, MQ; Jiang, XM; Dong, B; Liu, H
1998
发表期刊EUROPHYSICS LETTERS
卷号42期号:3页码:#REF!
通讯作者Wang, J (reprint author), Chinese Acad Sci, Ctr Synchrotron Radiat, Inst High Energy Phys, POB 9182-7, Beijing 100039, Peoples R China.
摘要An X-ray reflectivity (XR) study of the dynamic evolution of the film surface was carried out for molybdenum (Mo) sputter-deposited onto silicon substrates. The Mo-air interface width grows with time, and exhibits a power law behavior. The growth exponent beta is found to be 0.42. The time-invariant self-affine behavior an the short-range scale has also been observed, and is consistent with the dynamic scaling theory. The roughness exponent alpha is found to be 0.89 +/- 0.05. Scanning tunneling microscopy (STM) was also used to characterize the surface and showed good agreement with the XR measurements.
文章类型Article
学科领域Physics
DOI10.1209/epl/i1998-00243-1
收录类别SCI
WOS类目Physics, Multidisciplinary
WOS记录号WOS:000073647200008
引用统计
被引频次:12[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/227404
专题多学科研究中心
推荐引用方式
GB/T 7714
Wang J,Li G,Cui MQ,et al. X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films[J]. EUROPHYSICS LETTERS,1998,42(3):#REF!.
APA 王俊.,黎刚.,崔明启.,姜晓明.,Wang, J.,...&Liu, H.(1998).X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films.EUROPHYSICS LETTERS,42(3),#REF!.
MLA 王俊,et al."X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films".EUROPHYSICS LETTERS 42.3(1998):#REF!.
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