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X-ray nonspecular scattering from amorphous Mo films
Ma HJ(马宏骥); Jiang XM(姜晓明); Cui MQ(崔明启); Xian DC(冼鼎昌); Ma, HJ; Jiang, XM; Cui, MQ; Xian, DC
Corresponding AuthorMa, HJ (reprint author), CHINESE ACAD SCI,INST HIGH ENERGY PHYS,BEIJING 100039,PEOPLES R CHINA.
AbstractX-ray nonspecular scattering method is used to study the structures of Mo thin films fabricated with magnetron sputtering under different Ar pressures, The results show that with the increase of Ar pressure, the density of amorphous Mo film decreased; the surface roughness of the films increased, while the surface coherent length decreased. The abnormal glow discharging in the sputtering processes interprets the observed results well.
Subject AreaPhysics
Indexed BySCI ; ADS
WOS SubjectPhysics, Multidisciplinary
WOS IDWOS:A1997XA76400009
ADS Bibcode1997ChPhL..14..190M
ADS URLhttps://ui.adsabs.harvard.edu/abs/1997ChPhL..14..190M
ADS CITATIONShttps://ui.adsabs.harvard.edu/abs/1997ChPhL..14..190M/citations
Citation statistics
Cited Times:1 [ADS]
Document Type期刊论文
Recommended Citation
GB/T 7714
Ma HJ,Jiang XM,Cui MQ,et al. X-ray nonspecular scattering from amorphous Mo films[J]. CHINESE PHYSICS LETTERS,1997,14(3):#REF!.
APA 马宏骥.,姜晓明.,崔明启.,冼鼎昌.,Ma, HJ.,...&Xian, DC.(1997).X-ray nonspecular scattering from amorphous Mo films.CHINESE PHYSICS LETTERS,14(3),#REF!.
MLA 马宏骥,et al."X-ray nonspecular scattering from amorphous Mo films".CHINESE PHYSICS LETTERS 14.3(1997):#REF!.
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