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Synchrotron radiation topographic observation of KTiOPO4 crystals under an electric field
Liu, WJ; Jiang, SS; Ding, Y; Wu, XS; Wang, JY; Hu, XB; Jiang, JH; Jiang JH(蒋建华)
1999
发表期刊JOURNAL OF APPLIED CRYSTALLOGRAPHY
卷号32期号:2页码:#REF!
通讯作者Liu, WJ (reprint author), Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China.
文章类型Article
摘要In situ white-beam synchrotron radiation topographic observations under an electric field have been made on the KTiOPO4 (KTP) family of crystals. The investigation shows a strong enhancement of diffracted intensity for hkl reflections (l not equal 0) and topographic contrast in the form of fine striations when the external electric field is parallel to the polar axis. Several kinds of doped and undoped samples with various grown-in defects, such as domain boundaries, growth striations, growth-sector boundaries, dislocations, etc., have been studied in detail. The results suggest that these defects have very little effect on the field-induced striations. It is believed that the movement of K+ ions driven by the electric field leads to a local accumulation of charges and a lattice distortion. The strongly anisotropic conductivity is a governing factor in the explanation of the field-related phenomena in this kind of quasi-one-dimensional conductor.
学科领域Crystallography
DOI10.1107/S0021889898011248
收录类别SCI
WOS类目Crystallography
WOS记录号WOS:000079981900007
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/226793
专题多学科研究中心
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Liu, WJ,Jiang, SS,Ding, Y,et al. Synchrotron radiation topographic observation of KTiOPO4 crystals under an electric field[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY,1999,32(2):#REF!.
APA Liu, WJ.,Jiang, SS.,Ding, Y.,Wu, XS.,Wang, JY.,...&蒋建华.(1999).Synchrotron radiation topographic observation of KTiOPO4 crystals under an electric field.JOURNAL OF APPLIED CRYSTALLOGRAPHY,32(2),#REF!.
MLA Liu, WJ,et al."Synchrotron radiation topographic observation of KTiOPO4 crystals under an electric field".JOURNAL OF APPLIED CRYSTALLOGRAPHY 32.2(1999):#REF!.
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