Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application
Xie, CQ; Niu, JB; Wang, DQ; Dong, LJ; Chen, DP; Yi, FT; Zhang, JF; Yi FT(伊福廷); Zhang JF(张菊芳)
刊名HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
2005
卷号29页码:#REF!
关键词proximity X-ray lithography X-ray mask TaSi film inductively coupled plasma synchrotron radiation
学科分类Physics
其他题名氮化硅/钽硅X射线光刻掩膜研制与应用
通讯作者Xie, CQ (reprint author), Chinese Acad Sci, Inst Microelect, Key Lab Nanofabricat & Novel Devices Integrated T, Beijing 100010, Peoples R China.
文章类型Article
英文摘要After more than 30 years research and Development, Proximity X-ray lithography has matured considerably and it has many advantages, such as high resolution, long depth of focus, large process latitude, high throughout and so on. For X-ray mask absorber, if Au. metal is selected, it can only be plated and may pollute the silicon-based integrated circuits. TaSi film can be dry etching and does not pollute the silicon-based integrated circuits, it is a potential candidate for X-ray mask absorber. In this paper, the home-made silicon nitride /TaSi X-ray mask fabrication process is described, unlike the conventional fabrication process, after e-beam exposure and development, is etched Inductively Coupled Plasma(ICP) etching based on SF6/CHF3 gas chemistries is used to pattern the TaSi film, using ZEP520 e-beam resist as the barrier layer directly. Primary experimental result demonstrated this X-ray mask fabrication process is feasible.
类目[WOS]Physics, Nuclear ; Physics, Particles & Fields
收录类别SCI
WOS记录号WOS:000234206900037
引用统计
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/226457
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
中国科学院高能物理研究所_多学科研究中心
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Xie, CQ,Niu, JB,Wang, DQ,et al. Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29:#REF!.
APA Xie, CQ.,Niu, JB.,Wang, DQ.,Dong, LJ.,Chen, DP.,...&张菊芳.(2005).Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29,#REF!.
MLA Xie, CQ,et al."Fabrication of silicon nitride/refractory metal tantalum X-ray mask and its application".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29(2005):#REF!.
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