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Study on synchrotron radiation lithography at BSRF
其他题名BSRF上同步辐射深度光刻的实验研究
Peng LQ(彭良强); Yi FT(伊福廷); Han Y(韩毅); Zhang JF(张菊芳); Peng, LQ; Yi, FT; Han, Y; Zhang, JF
2001
发表期刊HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
卷号25页码:#REF!
通讯作者Peng, LQ (reprint author), CAS, Inst High Energy Phys, Beijing 100039, Peoples R China.
摘要It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography. A successive exposure method with present masks is put forward in this paper. Microstructures with thickness 2.2mm have been obtained by this method. A serial of studies of the effects on aspect ratio of mask, PMMA resist, substrate, wavelength range and dose of X rays have been processed. Microstructures with aspect ratio 104 have been obtained under optimized condition.
文章类型Article
关键词synchrotron radiation lithography ultra-deep microstructure high aspect ratio
学科领域Physics
收录类别SCI
WOS类目Physics, Nuclear ; Physics, Particles & Fields
WOS记录号WOS:000176377600026
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文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/226358
专题多学科研究中心
推荐引用方式
GB/T 7714
Peng LQ,Yi FT,Han Y,et al. Study on synchrotron radiation lithography at BSRF[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2001,25:#REF!.
APA 彭良强.,伊福廷.,韩毅.,张菊芳.,Peng, LQ.,...&Zhang, JF.(2001).Study on synchrotron radiation lithography at BSRF.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,25,#REF!.
MLA 彭良强,et al."Study on synchrotron radiation lithography at BSRF".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 25(2001):#REF!.
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