| Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers |
其他题名 | 周期性多层膜合金化制取的Ni-Ti形状记忆薄膜的相深度分布
|
| Wei XJ(魏向军); Xu Q(徐清) ; Jia QJ(贾全杰) ; Wang HH(王焕华) ; Wei, XJ; Xu, Q; Jia, QJ; Wang, HH
|
| 2005
|
发表期刊 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
 |
卷号 | 29页码:#REF! |
通讯作者 | Wei, XJ (reprint author), Lanzhou Univ, Inst Phys Sci & Technol, Lanzhou 730000, Peoples R China.
|
文章类型 | Article
|
摘要 | Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films.. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite,and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion. and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films. |
关键词 | phase depth profile
shape memory
Ni-Ti
multilayers
|
学科领域 | Physics
|
收录类别 | SCI
|
WOS类目 | Physics, Nuclear
; Physics, Particles & Fields
|
WOS记录号 | WOS:000234206900011
|
引用统计 |
|
文献类型 | 期刊论文
|
条目标识符 | http://ir.ihep.ac.cn/handle/311005/225682
|
专题 | 多学科研究中心
|
推荐引用方式 GB/T 7714 |
Wei XJ,Xu Q,Jia QJ,et al. Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29:#REF!.
|
APA |
魏向军.,徐清.,贾全杰.,王焕华.,Wei, XJ.,...&Wang, HH.(2005).Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29,#REF!.
|
MLA |
魏向军,et al."Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29(2005):#REF!.
|
修改评论