| Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers |
| 其他题名 | 周期性多层膜合金化制取的Ni-Ti形状记忆薄膜的相深度分布
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| Wei XJ(魏向军); Xu Q(徐清) ; Jia QJ(贾全杰); Wang HH(王焕华); Wei, XJ; Xu, Q; Jia, QJ; Wang, HH
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| 2005
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| 发表期刊 | HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
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| 卷号 | 29页码:#REF! |
| 通讯作者 | Wei, XJ (reprint author), Lanzhou Univ, Inst Phys Sci & Technol, Lanzhou 730000, Peoples R China.
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| 文章类型 | Article
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| 摘要 | Phase depth profile in NiTi shape memory alloy films made up from sputter-deposited Ni/Ti multilayers is studied by Grazing-Incidence X-Ray Diffraction. Phase depth profile is not uniform in NiTi films.. Both samples show there is a multiphase mixture region of Ti3Ni4 precipitates, martensite,and a little of austenite near the free surface and a uniform Martensite phase near the substrate. Diffusion. and reaction take place between film and substrate. Different periodical thickness will affect the phase depth profile in the after-annealing films. |
| 关键词 | phase depth profile
shape memory
Ni-Ti
multilayers
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| 学科领域 | Physics
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| 收录类别 | SCI
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| WOS类目 | Physics, Nuclear
; Physics, Particles & Fields
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| WOS记录号 | WOS:000234206900011
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://ir.ihep.ac.cn/handle/311005/225682
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| 专题 | 多学科研究中心
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推荐引用方式
GB/T 7714 |
Wei XJ,Xu Q,Jia QJ,et al. Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29:#REF!.
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| APA |
魏向军.,徐清.,贾全杰.,王焕华.,Wei, XJ.,...&Wang, HH.(2005).Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29,#REF!.
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| MLA |
魏向军,et al."Phase depth profile in Ni-Ti shape memory alloy films made up from sputter-deposited Ni/Ti multilayers".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29(2005):#REF!.
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