The optimization of a self-focusing e-beam evaporator for carbon evaporation and the application for graphene growth
Chen, S; Fan, LL; Wang, J; Pan, Y; Chen, FH; Xu, PS; Zou, CW; Wu, ZY;吴自玉
刊名SURFACE & COATINGS TECHNOLOGY
2014
卷号258页码:1196-1201
关键词graphene E-beam evaporator Electric field Molecular beam epitaxy
学科分类Materials Science; Physics
DOI10.1016/j.surfcoat.2014.07.009
英文摘要A self-focusing e-beam evaporator for carbon flux source in a molecular beam epitaxy (MBE) system has been designed and optimized. It is found that the configuration of the e-beam evaporator is very important for the solid carbon evaporation. According to the electric field simulation and the followed suitable design, the self-focusing e-beam evaporator for carbon flux evaporation can be achieved with high efficiency and good stability. This easy designed e-beam evaporator is adopted to produce stable and controllable carbon flux in a MBE system for large-area graphene layers preparation, which shows promising application for graphene-based device fabrication in the future. (C) 2014 Elsevier B.V. All rights reserved.
收录类别SCI
WOS记录号WOS:000346895000146
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文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/225381
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
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Chen, S,Fan, LL,Wang, J,et al. The optimization of a self-focusing e-beam evaporator for carbon evaporation and the application for graphene growth[J]. SURFACE & COATINGS TECHNOLOGY,2014,258:1196-1201.
APA Chen, S.,Fan, LL.,Wang, J.,Pan, Y.,Chen, FH.,...&Wu, ZY;吴自玉.(2014).The optimization of a self-focusing e-beam evaporator for carbon evaporation and the application for graphene growth.SURFACE & COATINGS TECHNOLOGY,258,1196-1201.
MLA Chen, S,et al."The optimization of a self-focusing e-beam evaporator for carbon evaporation and the application for graphene growth".SURFACE & COATINGS TECHNOLOGY 258(2014):1196-1201.
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