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Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching
Zhang XS(张新帅); Liu J(刘静); Wang B(王波); Zhang TC(张天冲); 伊福廷;Zhang, XS; Liu, J; Wang, B; Zhang, TC; Yi, FT
2014
发表期刊AIP ADVANCES
卷号4期号:3页码:31335
摘要Nanotip arrays with high aspect ratio, which have attracted much attention due to their potential applications, have been fabricated by many methods. Dry etching combined with self-assembly masks is widely used because of the convenience of dry etching and high throughput of self-assembly. In this paper, we report a method combining Cesium Chloride (CsCl) self-assembly with inductively coupled plasma (ICP) dry etching to fabricate silicon nanotip arrays with high aspect ratio and silicon nanotip arrays with aspect ratio 15 have been achieved after optimization of all parameters. (C) 2014 Author(s).
学科领域Science & Technology - Other Topics; Materials Science; Physics
DOI10.1063/1.4869238
收录类别SCI
WOS记录号WOS:000334213700036
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/224807
专题多学科研究中心
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GB/T 7714
Zhang XS,Liu J,Wang B,et al. Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching[J]. AIP ADVANCES,2014,4(3):31335.
APA 张新帅.,刘静.,王波.,张天冲.,伊福廷;Zhang, XS.,...&Yi, FT.(2014).Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching.AIP ADVANCES,4(3),31335.
MLA 张新帅,et al."Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching".AIP ADVANCES 4.3(2014):31335.
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