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Fabrication and antireflection properties of solar cells with pyramid-nanohole texture by caesium chloride lithography
Liu J(刘静); Zhang TC(张天冲); Liu, J; Zhang, TC; Dong, GQ; Zhang, XS; Wang, B; Liao, YX; Yi, FT; Zhang XS(张新帅); Wang B(王波); Yi FT(伊福廷)
2013
发表期刊JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷号46期号:37页码:375302
摘要Pyramids and nanoholes are integrated together to form a micro-nano-texture on silicon surface in order to suppress reflection for silicon solar cell application. The nanoholes are formed by inductively coupled plasma (ICP) dry etching employing a nanoporous aluminum (Al) mask which is fabricated by caesium chloride (CsCl) nanoislands lift-off technique. Reflection of less than 4% can be reached by pyramid-nanohole texture, which is much lower than that from pure pyramids or nanoholes texture. Higher short circuit current density (J(sc)) and photovoltaic conversion efficiency (PCE) are obtained for the solar cell with pyramid-nanohole texture due to its better antireflection. The average diameter and depth of the nanoholes affect the solar cell properties. The smaller and deeper nanoholes can suppress reflection a lot, but meanwhile, the formation of them means more crystal lattice defects generated from ICP etching. An optimized diameter of 800 nm and depth of 1 mu m for the nanoholes are obtained in our experiments to get the best photovoltaic performance that is a PCE of 14.89% with a J(sc) of 38.25 mA cm(-2) and an open circuit voltage (V-oc) of 544.8 mV.
学科领域Physics
DOI10.1088/0022-3727/46/37/375302
收录类别SCI
WOS记录号WOS:000324098300011
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被引频次:6[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/224688
专题多学科研究中心
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GB/T 7714
Liu J,Zhang TC,Liu, J,et al. Fabrication and antireflection properties of solar cells with pyramid-nanohole texture by caesium chloride lithography[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2013,46(37):375302.
APA 刘静.,张天冲.,Liu, J.,Zhang, TC.,Dong, GQ.,...&伊福廷.(2013).Fabrication and antireflection properties of solar cells with pyramid-nanohole texture by caesium chloride lithography.JOURNAL OF PHYSICS D-APPLIED PHYSICS,46(37),375302.
MLA 刘静,et al."Fabrication and antireflection properties of solar cells with pyramid-nanohole texture by caesium chloride lithography".JOURNAL OF PHYSICS D-APPLIED PHYSICS 46.37(2013):375302.
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