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Structure and magnetic properties of Ni-doped AlN films
Pan, D; Jian, JK; Ablat, A; Li, J; Sun, YF; Wu, R
2012
发表期刊JOURNAL OF APPLIED PHYSICS
卷号112期号:5页码:53911
摘要We report the crystal structure and magnetic properties of Al1-xNixN films with 0 <= x <= 0.032 deposited on Si (100) substrates by radio frequency reactive sputtering. X-ray diffractometry, x-ray photoemission spectroscopy, and x-ray absorption fine structure analysis clearly showed that Ni atoms were successfully incorporated into AlN, while the crystal structure of the films was maintained. All the doped samples exhibited ferromagnetism both at 5 K and 300 K. The saturation magnetizations (M-s) and coercive fields (H-c) tended to decrease as Ni concentration increased from 0.019 to 0.032, the maximum M-s obtained at 5 K and 300 K were about 0.025 and 0.014 emu/g, respectively, and the corresponding H-c were 208 and 60 Oe. Temperature dependence of remanent magnetization showed that the ferromagnetic transition temperature was beyond 300 K. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4749408]
学科领域Physics
DOI10.1063/1.4749408
收录类别SCI
WOS记录号WOS:000309072200088
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被引频次:12[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/224558
专题多学科研究中心
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Pan, D,Jian, JK,Ablat, A,et al. Structure and magnetic properties of Ni-doped AlN films[J]. JOURNAL OF APPLIED PHYSICS,2012,112(5):53911.
APA Pan, D,Jian, JK,Ablat, A,Li, J,Sun, YF,&Wu, R.(2012).Structure and magnetic properties of Ni-doped AlN films.JOURNAL OF APPLIED PHYSICS,112(5),53911.
MLA Pan, D,et al."Structure and magnetic properties of Ni-doped AlN films".JOURNAL OF APPLIED PHYSICS 112.5(2012):53911.
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