Oxygen pressure dependent VO2 crystal film preparation and the interfacial epitaxial growth study
Fan, LL; Wu, YF; Si C(姒程); Si, C; Zou, CW; Qi, ZM; Li, LB; Pan, GQ; Wu, ZY; Wu ZY(吴自玉)
刊名THIN SOLID FILMS
2012
卷号520期号:19页码:6124-6129
关键词Vanadium dioxide Epitaxial growth Phase transition X-ray diffraction Pulsed laser deposition
学科分类Materials Science; Physics
DOI10.1016/j.tsf.2012.05.086
英文摘要High quality VO2 crystal films have been prepared on sapphire substrates by pulsed laser deposition method and the effects of oxygen pressure on the crystal phase structure are investigated. Results indicate that the phases and microstructures of VO2 films are strongly sensitive to oxygen pressure. High oxygen pressure tends to form coarse B-VO2 nanocrystals while low pressure favors a flat M1-VO2 film epitaxial growth. X-ray diffraction f- scan patterns confirm the [020] epitaxial growth orientation of the M1-VO2 film and the in-plane lattice epitaxial relationship at the interface is also examined. Raman spectra indicate that M1-VO2 phase has much stronger Raman scattering modes than B-VO2, and the clear phonon modes further confirm the idea stoichiometry of VO2 crystal film. Infrared transmittance spectra as the function of temperature are recorded and the results show that M1-VO2 crystal films undergo a distinct infrared transmittance variation across metal insulator transition boundary, while B-VO2 exhibits negligible thermochromic switching properties in the temperature range concerned. The pronounced phase transition behavior of the M1-VO2 crystal film makes it a promising candidate for optical filter/switch and smart window applications in the future. (C) 2012 Elsevier B.V. All rights reserved.
收录类别SCI
WOS记录号WOS:000306104900013
引用统计
被引频次:26[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.ihep.ac.cn/handle/311005/224274
专题中国科学院高能物理研究所_多学科研究中心_期刊论文
推荐引用方式
GB/T 7714
Fan, LL,Wu, YF,Si C,et al. Oxygen pressure dependent VO2 crystal film preparation and the interfacial epitaxial growth study[J]. THIN SOLID FILMS,2012,520(19):6124-6129.
APA Fan, LL.,Wu, YF.,姒程.,Si, C.,Zou, CW.,...&吴自玉.(2012).Oxygen pressure dependent VO2 crystal film preparation and the interfacial epitaxial growth study.THIN SOLID FILMS,520(19),6124-6129.
MLA Fan, LL,et al."Oxygen pressure dependent VO2 crystal film preparation and the interfacial epitaxial growth study".THIN SOLID FILMS 520.19(2012):6124-6129.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
7574.pdf(1033KB)期刊论文作者接受稿开放获取CC BY-NC-SA浏览 请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Fan, LL]的文章
[Wu, YF]的文章
[姒程]的文章
百度学术
百度学术中相似的文章
[Fan, LL]的文章
[Wu, YF]的文章
[姒程]的文章
必应学术
必应学术中相似的文章
[Fan, LL]的文章
[Wu, YF]的文章
[姒程]的文章
相关权益政策
暂无数据
收藏/分享
文件名: 7574.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。