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基片温度与氧分压对磁控溅射制备氧化钒薄膜的影响
Alternative TitleThe effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering
张辉; 刘应书; 刘文海; 王宝义; 魏龙
2007
Source Publication物理学报
Issue12Pages:7255-7261
Corresponding Author张辉
Keyword氧化钒 磁控溅射 相变薄膜 X射线光电子能谱
Funding Organization国家自然科学基金(批准号:10275077)资助的课题.~~
Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/222554
Collection多学科研究中心
Recommended Citation
GB/T 7714
张辉,刘应书,刘文海,等. 基片温度与氧分压对磁控溅射制备氧化钒薄膜的影响[J]. 物理学报,2007(12):7255-7261.
APA 张辉,刘应书,刘文海,王宝义,&魏龙.(2007).基片温度与氧分压对磁控溅射制备氧化钒薄膜的影响.物理学报(12),7255-7261.
MLA 张辉,et al."基片温度与氧分压对磁控溅射制备氧化钒薄膜的影响".物理学报 .12(2007):7255-7261.
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