IHEP OpenIR  > 多学科研究中心
同步辐射掠出射X射线荧光分析薄膜膜厚
Alternative TitleThickness Analysis for Thin-Film by Glazing Exit X-ray Fluorescence with Synchrotron Radiation Source
巩岩; 陈波; 尼启良; 崔明启; 赵屹东; 吴忠华
2005
Source Publication高能物理与核物理
Issue11Pages:1104-1106
Keyword同步辐射光源 掠出射 X射线荧光 薄膜
Funding Organization应用光学国家重点实验室基金(DA00Q02D)~~
Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/222265
Collection多学科研究中心
Recommended Citation
GB/T 7714
巩岩,陈波,尼启良,等. 同步辐射掠出射X射线荧光分析薄膜膜厚[J]. 高能物理与核物理,2005(11):1104-1106.
APA 巩岩,陈波,尼启良,崔明启,赵屹东,&吴忠华.(2005).同步辐射掠出射X射线荧光分析薄膜膜厚.高能物理与核物理(11),1104-1106.
MLA 巩岩,et al."同步辐射掠出射X射线荧光分析薄膜膜厚".高能物理与核物理 .11(2005):1104-1106.
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5590.pdf(456KB)期刊论文作者接受稿限制开放CC BY-NC-SAApplication Full Text
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