IHEP OpenIR  > 多学科研究中心
多层膜界面粗糙度的低角X射线衍射研究
Alternative TitleSTUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION
王凤平; 崔明启; 王佩璇; 方正知
1996
Source Publication金属学报
Issue7Pages:774-779
Keyword多层膜 磁控溅射 低角X射线衍射 界面粗糙度
Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/221486
Collection多学科研究中心
Recommended Citation
GB/T 7714
王凤平,崔明启,王佩璇,等. 多层膜界面粗糙度的低角X射线衍射研究[J]. 金属学报,1996(7):774-779.
APA 王凤平,崔明启,王佩璇,&方正知.(1996).多层膜界面粗糙度的低角X射线衍射研究.金属学报(7),774-779.
MLA 王凤平,et al."多层膜界面粗糙度的低角X射线衍射研究".金属学报 .7(1996):774-779.
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