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Ar气压强对溅射沉积的W/Si多层膜界面粗糙度的影响
Alternative TitleTHE EFFECT OF Ar PRESSURE ON INTERFACIAL ROUGHNESS FOR W/Si MULTILAYERS
王凤平; 王佩璇; 崔明启; 方正知
1995
Source Publication功能材料与器件学报
Issue1Pages:53-57
Keyword磁控溅射 多层膜 小角X-射线衍射 界面粗糙度
Document Type期刊论文
Identifierhttp://ir.ihep.ac.cn/handle/311005/221389
Collection多学科研究中心
Recommended Citation
GB/T 7714
王凤平,王佩璇,崔明启,等. Ar气压强对溅射沉积的W/Si多层膜界面粗糙度的影响[J]. 功能材料与器件学报,1995(1):53-57.
APA 王凤平,王佩璇,崔明启,&方正知.(1995).Ar气压强对溅射沉积的W/Si多层膜界面粗糙度的影响.功能材料与器件学报(1),53-57.
MLA 王凤平,et al."Ar气压强对溅射沉积的W/Si多层膜界面粗糙度的影响".功能材料与器件学报 .1(1995):53-57.
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